潘文霞

  • 潘文霞
  • 1982年1月  西安交通大学机械工程系热处理专业学士
    1982年10月 留学日本。
    1988年9月在日本东京大学获工学博士学位,后在日本大阪大学、东京大学等单位工作
    1996年 回国在北京科技大学做博士后
    1997年 入选中国科学科院“百人计划”
    1998年 到力学所工作
     

    现在主要研究方向:

    热等离子体的产生与状态控制、光谱与探针诊断,高温部分电离气体射流的稳定性与流场测量;
    等离子体与材料表面的相互作用及换热效果,实验测量与理论分析;
    等离子体表层材料制备与改性,包括热障涂层制备、抗热冲击性能检测、金属表面熔凝或熔敷强化工艺、薄膜沉积;
    冷等离子体薄膜工艺。
    过去主要从事过铸铁的离子渗氮、高频与直流叠加的热等离子体CVD法制备陶瓷纳米粉、低气压弧光等离子体烧结、等离子体喷涂、等离子体材料表面改性、金属与陶瓷的接合及其界面、热等离子体CVD制备大面积金刚石膜,以及直流大气压层流等离子体射流产生、磁扩弧等离子体发生器研制等方面的研究。
     

    代表论著:编辑

    # W.X.Pan,, X.Meng, and C.K.Wu, “Laminar plasma jets: generation, characterization and applications for material surface processing”, Pure Appl. Chem., 77(2) 2005, 373-378.
    # W.X.Pan, X.Meng, Q.X.Fei and C.K.Wu, “Feasibility of laminar plasma-jet hardening of cast iron surface”, Surface & Coatings Technology, (2005).
    # G. Li, W.X.Pan, X.Meng and C.K.Wu, “Application of Similarity Theory to the Characterization of Non-transferred Laminar Plasma Generation”, Plasma Sources Sci. Technol., 14 (2005) 219-225.
    # , W.X.Pan and C.K.Wu, “Preliminary Investigations on Low-Pressure Laminar Plasma Spray Processing”, Surface & Coatings Technology, 191(2005)166-174.
    # W. X. Pan, W. H. Zhang, W. Ma and C. K. Wu,Characteristics of argon laminar DC plasma jet at atmospheric pressure,Plasma Chemistry and Plasma Processing, 22 [2], 271-283, 2002.
    # W.X.Pan, W.H.Zhang, W.H.Zhang, and C.K.Wu, “Generation of Long, Laminar Plasma Jets at Atmospheric Pressure and Effects of Flow Turbulence”, Plasma Chemistry and Plasma Pro-cessing, 21(1),2001, 23-35.
    # W.X.Pan, F., W.Z.Tang, G.F.Zhong, Z.Jiang and C.K.Wu, “Carbon transition efficiency and process cost in high-rate, large-area deposition of diamond films by DC arc plasma jet”, Diamond and Related Materials, 9, 1682-1686, 2000.
    # W.X.Pan, T.Okamoto and X.S.Ning, “Joining of Al-plasma-sprayed Si3N4 ceramics”, J. Mater. Sci., 29, 1436-1440. (1994).
    # W.X.Pan, T.Okamoto, Y.Miyamoto, X.S.Ning, H.Matsumoto and T.Yoshida, “Plasma spray deposition of fine SiC powder”, J. Am. Ceram. Soc., 76 [5] 1335-1339 (1993).
    # W.X.Pan, H.Sato, T.Yoshida and K.Akashi, “Plasma sintering of ultrafine amorphous Si3N4”, Advaced Ceramic Materials (J. Am. Ceram. Soc.), 3[1] 77-79 (1988).
    * W.X.Pan, W.H.Zhang, and C.K.Wu, “Generation and characterization of laminar-flow DC plasma jet at atmospheric pressure”, 5th Asia-Pacific Conf. On Plasma Sci. & Tech., Dalian, Sep. 10-13, 2000, pp.O-04, Invited topic.
    * W. X. Pan and C. K. Wu,Vacuum plasma spray for high quality TBC,JSPS Inter. Symp. on Thermal Plasma Deposition, Tokyo , Jan. 28, 2002, ed. by T. Yoshida, etc., pp.29-35, Invited.
    * W. X. Pan, G. Li, X. Meng, C. K. WU, “Laminar plasma jets: generation, characterization and applications for material surface processing”, In the proceedings of ISPC-16, Taormina, Italy, 2003, P. 247. (Invited)
    * Wen-Xia Pan, Xian Meng, Kai Cheng, Dong-Yan Xu, Xi Chen, Cheng-Kang Wu. Flow field comparison of laminar and turbulent DC arc plasma jets. 7th Asia Pacific Conference on Plasma Science and Technology, June 29 – July 2, 2004, Fukuoka, Japan. P. 67. (Abstract; Invited).